Applying high speed milling for rapid cross-section polishing can reduce preparation time and improve SEM, EDS, and EBSD analytical performance.
3D metal printing via EBM is a unique, high-energy pathway that operates in a vacuum environment, providing remarkably energy efficient and reliable additive manufacturing.
Read through our deep dive into JEOL SEM microscopes, where we detail our Benchtop, InTouchScope™, and Field Emission SEMs, to learn which is right for you.
Correlative light and electron microscopy (CLEM) is a correlative imaging approach that links molecular function with ultrastructure. Learn more about it now!
Silicon drift detectors (SDDs) fit into energy dispersive spectroscopy (EDS) by enabling high count rates, low noise, improved energy resolution, and energy mapping.
E-beam lithography enables sub-10 nm patterning for prototyping, masks, and quantum devices with JEOL’s high-precision JBX systems.
An electron beam's nanometer-scale focus enables sub-10 nm lithography with unmatched precision and minimal blur.
In our article, we consider how e-beams are essential for overcoming key challenges in DRAM transistor formation. Discover more about their impact here.
Field ionization works by using intense electric fields to remove electrons, preserving molecular ions for mass analysis and composition determination.